Molecular formula: H2O2 Content: 27-50%
CAS No: 7722-84-1 package: 4L / bottle 1000L / barrel tank
Application: electronic grade hydrogen peroxide is a very important high-purity reagent in microelectronics industry. It is mainly used as semiconductor silicon wafer cleaning agent, etchant and photoresist remover. It can also be used for the preparation of advanced insulating layer, the removal of inorganic impurities in electroplating solution, the treatment of copper, copper alloy, gallium and germanium in electronics industry, and the etching and cleaning of solar silicon wafer. In the process of treatment, the impurities in the reagent will have a fatal impact on the performance of components. Therefore, hydrogen peroxide has relatively high requirements for purity.